Plasma cleaner for hydrocarbon contamination removal on SEM and FIB

Tergeo desktop plasma cleaners

Sample cleaning & etching

Surface wettability modification

Promote bondability & adhesion

PIE stands for Plasma, Ion and Electron. We specializes in developing plasma sources and their applications in plasma etching, sample surface modification, contamination removal, ion and electron beam production. Our mission is to bring the latest plasma technology developed in the semiconductor research into affordable plasma instruments for research communities. We take great pride in our engineering design and technical capability. Therefore, you can return our product anytime if you are not satisfied! Please contact us for details on anytime return policy.