Plasma ion source, LMIS and GFIS are three common types of ion sources. LMIS and GFIS have excellent source brightness. Therefore they are widely used in high resolution ion beam imaging and micromaching applications. However, total current from LMIS and GFIS is many orders of magnitude lower than plasma ion sources. If feature size is larger than 50nm, plasma ion source can achieve much higher throughput than LMIS and GFIS.
Plasma ion source can generate different kinds of ions by changing process gases. In addition, plasma ion sources are capable of generating negative ion species combined with mass filter.
We have extensive experience in designing customized high brightness plasma ion soruces and ion optics column for research laboratories in universities and industries. Please contact us to discuss your requirements.