Tergeo-plus desktop plasma cleaner

 

Tergeo-EM plasma cleaner for SEM/TEM sample cleaning

 

Tergeo tabletop plasma cleaners

  • Chip cleaning before wire bonding
  • SEM/TEM sample cleaning for hydrocarbon contamination removal
  • Plasma treatment for hydrophilic or hydrophobic surface wettability
  • Surface preparation to improve epoxy/glue bonding strength
  • Improve wettability for MEMS microfluidics devices.
  • Photoresist ashing and wafer descum
  • Device decapsulation for failure analysis.

 



Plasma source

 

Plasma source

 

Remote plasma cleaner for SEM, FIB, XPS, etc

  • In-situ sample cleaning for FE-SEM, FIB and TEM
  • Contamination removal for semiconductor equipment, such as CD-SEM, EBR, EBI, EUVL
  • High vacuum chamber cleaning to remove hydrocarbon contamination condensation.
  • Chamber and sample cleaning for XPS, SIMS, AES
  • Chamber and sample cleaning for ALD

Plasma source Plasma source

 


 

High brightness ion sources

In collaboration with the ion beam technology group in the Lawrence Berkeley National Laboratory, we develop many high brightness ion sources based on ICP plasma source technologies. Our technical staff can provide customized design specifically optimized for your applications. Our technologies includes: low pressure ion source for sealed tube application; low energy spread (<2eV) muticusp ion source; miniaturized ion source etc.

 


 

High resolution electron and ion optics design service

Our technical staff have decades of experience in designing electron and ion columns capable of sub-nm resolution. We are experienced in designing charged particle optics with MEBS, EGUN, IGUN and Opera simulation software. We can simulation electrostatic and magnetic lenses and deflectors and other customized 3D structures with space charge effect and stochastic charge interaction effect included. Please contact us to discuss your requirement and our capability.