500-Watt power supply for high-speed photoresist ashing and descum

More power high speed.

Su-8 photoresist layer can range from several microns to hundreds to microns. To increase the ashing speed for the thick photoresist layer, PIE Scientific LLC recently released 500-watt rf power supply options for our Tergeo-plus plasma system. The New 500-watt rf power supply increases the photoresist ashing speed to more than one micron per minute. It also greatly increased the pressure range for oxygen plasma. High-pressure oxygen plasma also reduces the ion energy and reduces the ion sputtering-induced damage to the underlying layers.

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PIE Scientific LLC integrates the latest plasma technology into affordable tabletop laboratory plasma equipment. We are not providing just another plasma equipment. We provide many unique plasma technologies that are not available on competitive products.