More power high speed.
Su-8 photoresist layer can range from several microns to hundreds to microns. To increase the ashing speed for the thick photoresist layer, PIE Scientific LLC recently released 500-watt rf power supply options for our Tergeo-plus plasma system. The New 500-watt rf power supply increases the photoresist ashing speed to more than one micron per minute. It also greatly increased the pressure range for oxygen plasma. High-pressure oxygen plasma also reduces the ion energy and reduces the ion sputtering-induced damage to the underlying layers.
