Plasma Ion Source Based on RF and Microwave Discharge Technologies

High brightness plasma ion sources for variable applications

Plasma ion source, LMIS, and GFIS are three common types of ion sources. LMIS and GFIS have excellent source brightness. Therefore they are widely used in high-resolution ion beam imaging and micromachining applications. However, the total current from LMIS and GFIS is many orders of magnitude lower than plasma ion sources. If the feature size is larger than 50nm, the plasma ion source can achieve a much higher throughput than LMIS and GFIS.

Plasma ion source can generate different kinds of ions by changing process gases. In addition, plasma ion sources are capable of generating negative ion species combined with mass filter.

T shape plasma ion source for improved ion extraction
High brightness miniature plasma ion source

We have extensive experience in designing customized high brightness plasma ion sources and ion optics column for research laboratories in universities and industries. Please contact us to discuss your requirements.

Extracted argon and krypton current density through 1mm aperture
Hydrogen positive ion current density through 1mm aperture from mini ion source
Resist exposure image on ion projection system IPLM-02 in Berlin equipped with our low energy spread ion source
Parallel patterning with low energy spread ion source on MMRL system in the Lawrence Berkeley National Laboratory